发明授权
- 专利标题： Hard carbon thin film and method of forming the same
- 专利标题（中）： 硬碳薄膜及其形成方法
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申请号： US09502531申请日： 2000-02-10
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公开(公告)号： US06528115B1公开(公告)日： 2003-03-04
- 发明人: Hitoshi Hirano , Yoichi Domoto , Keiichi Kuramoto
- 申请人： Hitoshi Hirano , Yoichi Domoto , Keiichi Kuramoto
- 优先权： JP9-66125 19970319; JP9-66126 19970319; JP9-259833 19970925
- 主分类号： C23C1626
- IPC分类号： C23C1626
摘要：
A hard carbon thin film formed on a substrate has a graded structure in which a ratio of sp2 to sp3 carbon-carbon bonding in the thin film decreases in its thickness direction from a thin film/substrate interface toward a surface of the thin film. A method of forming the thin film involves varying the film-forming ion species over time to produce the composition gradient or structural gradient in the thickness direction of the thin film.
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