发明授权
- 专利标题： Method and apparatus for transferring and supporting a substrate
- 专利标题（中）： 用于转移和支撑衬底的方法和装置
-
申请号： US09629322申请日： 2000-07-31
-
公开(公告)号： US06537011B1公开(公告)日： 2003-03-25
- 发明人: Danny Wang , Dmitry Lubomirsky , Erwin Polar , Brigitte Stoehr , Mark Wiltse , Yeuk-Fai Edwin Mok , Frank C. Ma
- 申请人： Danny Wang , Dmitry Lubomirsky , Erwin Polar , Brigitte Stoehr , Mark Wiltse , Yeuk-Fai Edwin Mok , Frank C. Ma
- 主分类号： B65G4907
- IPC分类号： B65G4907
摘要：
A method and apparatus for supporting and transferring a substrate in a semiconductor wafer processing system. In one aspect, a support ring having one or more substrate support members mounted thereon and defining a central opening therein for receipt of a substrate support member during processing is disclosed. In another aspect, a substrate handler blade having a plurality of substrate supports disposed thereon is provided which is adapted to support a substrate thereon and effectuate substrate transfer between the substrate handler blade and the support ring.