发明授权
- 专利标题: Capacitor and method for manufacturing the same
- 专利标题(中): 电容器及其制造方法
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申请号: US09650746申请日: 2000-08-30
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公开(公告)号: US06541813B1公开(公告)日: 2003-04-01
- 发明人: Shoko Niwa , Hiroshi Tomita , Kazuhiro Eguchi , Katsuhiko Hieda
- 申请人: Shoko Niwa , Hiroshi Tomita , Kazuhiro Eguchi , Katsuhiko Hieda
- 优先权: JP11-246169 19990831
- 主分类号: H01L2976
- IPC分类号: H01L2976
摘要:
The capacitor related to the present invention has a lower electrode, a dielectric film provided on the lower electrode and made mainly of crystal containing at Ti, O and at least one element selected from the group consisting of Ba and Sr, and an upper electrode provided on the dielectric film, wherein the dielectric film includes a layer which contacts the upper electrode. In case the dielectric film which has a thickness of at least 5 nm and exhibits a first-order differential spectrum measured by means of Auger electron spectroscopy, and the in the first-order differential spectrum, a ratio A/B is at most 0.3, where A is the absolute value A of a difference between a third peak appearing near 420 eV and a fourth peak appearing at a higher energy level and near the third peak, and B is the absolute value B of a difference between a first peak appearing near 410 eV and a third peak appearing at a lower energy level and near the first level.
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