发明授权
- 专利标题: Polishing pad and polisher
- 专利标题(中): 抛光垫和抛光机
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申请号: US10049664申请日: 2002-02-15
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公开(公告)号: US06544104B1公开(公告)日: 2003-04-08
- 发明人: Hisao Koike , Takeshi Arai , Akihiko Ikeda
- 申请人: Hisao Koike , Takeshi Arai , Akihiko Ikeda
- 优先权: JP11-242195 19990827
- 主分类号: B24B4900
- IPC分类号: B24B4900
摘要:
A window member (11) having an intentionally designed distribution of refractive index is used, as a transparent window member in a light transmission area of a polishing pad for detecting the end point of polishing by a CMP method. This window member (11) has areas (11a) having a high refractive index and areas (11b) having a low refractive index in its window face. In a cross section normal to the window face, the high-refractive index areas (11a) and the low-refractive index areas (11b) are alternately arranged in stripes. These areas (11a and 11b) in the window face are in a Fresnel zone plate arrangement in which the first area (center circle) is a bright one (area having a high refractive index). A plurality of such Fresnel zone plates (F) are arrayed in a matrix in the window face of the window member (11).
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