发明授权
- 专利标题: Substrate for fluid ejection device
- 专利标题(中): 用于流体喷射装置的基板
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申请号: US10135297申请日: 2002-04-30
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公开(公告)号: US06554403B1公开(公告)日: 2003-04-29
- 发明人: Chien-Hua Chen , Kenneth Michael Kramer
- 申请人: Chien-Hua Chen , Kenneth Michael Kramer
- 主分类号: B41J205
- IPC分类号: B41J205
摘要:
A substrate for a fluid ejection device includes a first side, a second side opposite the first side, spaced etch stops extending into the substrate from the first side, and a fluidic channel communicating with the first side and the second side, wherein a first portion of the fluidic channel extends from the first side toward the second side between the spaced etch stops and a second portion of the fluidic channel extends from the second side toward the first side to the spaced etch stops.
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