- 专利标题: Photosensitive material processing device
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申请号: US10177107申请日: 2002-06-24
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公开(公告)号: US06554508B1公开(公告)日: 2003-04-29
- 发明人: Ryoei Nozawa , Toshihiro Suya , Hideto Yamamoto , Takayuki Iwamoto , Shinichi Matsuda
- 申请人: Ryoei Nozawa , Toshihiro Suya , Hideto Yamamoto , Takayuki Iwamoto , Shinichi Matsuda
- 优先权: JP11-317771 19991109; JP2000-081480 20000323; JP2000-084970 20000324; JP2000-089850 20000328; JP2000-092060 20000329; JP2000-092062 20000329; JP2000-092063 20000329
- 主分类号: G03D308
- IPC分类号: G03D308
摘要:
In a shutter facing an aperture portion in a partition plate in a photosensitive material processing device, a blocking member, formed substantially in a semicircular cylindrical shape, is placed by the rotation of a shaft between blades thereby closing the aperture portion. The opening between the blades is opened by rotating the blocking member integrally with the shaft so that a photosensitive material can pass through. Multi-leveled surfaces are formed on the top surface of a guide plate. Aperture portions for mounting rollers with adaptors are formed in an alternating pattern on the surfaces. A plurality of protruding guide ribs are provided extending across the surfaces. A plurality of brush roller parameters are adjusted so that a winding mark index defined by the parameters falls within a predetermined range. Rollers are washed when a finisher control system is restarted after an unforeseen long stoppage.
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