发明授权
- 专利标题： Method and apparatus for updating a manufacturing model based upon fault data relating to processing of semiconductor wafers
- 专利标题（中）： 基于与半导体晶片的处理相关的故障数据更新制造模型的方法和装置
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申请号： US09351716申请日： 1999-07-12
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公开(公告)号： US06556959B1公开(公告)日： 2003-04-29
- 发明人: Michael L. Miller , Qingsu Wang
- 申请人： Michael L. Miller , Qingsu Wang
- 主分类号： G06F1900
- IPC分类号： G06F1900
摘要：
The present invention provides a method and apparatus for performing automated development and updating of a manufacturing model for a manufacturing process. An initial manufacturing model is developed. Tolerances of the manufacturing model are expanded using additional production data. The manufacturing model is then re-developed using the expanded tolerances.
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