- 专利标题: Substrate processing apparatus
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申请号: US10125229申请日: 2002-04-18
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公开(公告)号: US06558053B2公开(公告)日: 2003-05-06
- 发明人: Kazuhito Shigemori , Masakazu Sanada , Minobu Matsunaga , Katsushi Yoshioka , Kenji Sugimoto , Kaoru Aoki , Moritaka Yano , Satoshi Yamamoto , Tsuyoshi Mitsuhashi , Takashi Nagao , Mitsumasa Kodama , Yukihiko Inagaki , Yoshihisa Yamada
- 申请人: Kazuhito Shigemori , Masakazu Sanada , Minobu Matsunaga , Katsushi Yoshioka , Kenji Sugimoto , Kaoru Aoki , Moritaka Yano , Satoshi Yamamoto , Tsuyoshi Mitsuhashi , Takashi Nagao , Mitsumasa Kodama , Yukihiko Inagaki , Yoshihisa Yamada
- 优先权: JP2001-121228 20010419; JP2002-026338 20020204; JP2002-026852 20020204; JP2002-046587 20020222
- 主分类号: G03D500
- IPC分类号: G03D500
摘要:
A substrate processing apparatus includes a coating section, a developing section, a heat-treating section and a transport mechanism. The coating section has first processing units each for performing a coverage process to supply a photoresist solution to a substrate and cover a surface of the substrate with the photoresist solution, a second processing unit for spinning the substrate, after the coverage process, at high speed to make the photoresist solution into a film, dry the photoresist film, and clean the substrate. All substrates are processed with the same coating conditions to suppress differences in quality among the substrates. The first and second processing units perform the respective processes concurrently to improve the throughput of substrate processing.
公开/授权文献
- US20020152958A1 Substrate processing apparatus 公开/授权日:2002-10-24