Invention Grant
US06563170B2 Insulated gate bipolar transistor 失效
绝缘栅双极晶体管

  • Patent Title: Insulated gate bipolar transistor
  • Patent Title (中): 绝缘栅双极晶体管
  • Application No.: US09175424
    Application Date: 1998-10-20
  • Publication No.: US06563170B2
    Publication Date: 2003-05-13
  • Inventor: Tae-hoon Kim
  • Applicant: Tae-hoon Kim
  • Priority: KR1997-54216 19971022
  • Main IPC: H01L2976
  • IPC: H01L2976
Insulated gate bipolar transistor
Abstract:
An insulated gate bipolar transistor (IGBT) and a method for manufacturing the same is provided. This method is capable of preventing a latch-up and improving a short current characteristic. In the IGBT, a second conductive type semiconductor layer is formed over a semiconductor substrate. A first conductive type well is then formed beneath the surface of the semiconductor layer, and a second conductive type source region doped with a high concentration is formed in the well. Also, a gate electrode is formed over the semiconductor layer, but so as not to contact the source region in a region in which a contact between the source region and a cathode electrode is formed. Also, the IGBT further includes an impurity region for controlling latch-up, the impurity region being extended to a part of the semiconductor layer via the well.
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