Invention Grant
- Patent Title: Insulated gate bipolar transistor
- Patent Title (中): 绝缘栅双极晶体管
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Application No.: US09175424Application Date: 1998-10-20
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Publication No.: US06563170B2Publication Date: 2003-05-13
- Inventor: Tae-hoon Kim
- Applicant: Tae-hoon Kim
- Priority: KR1997-54216 19971022
- Main IPC: H01L2976
- IPC: H01L2976

Abstract:
An insulated gate bipolar transistor (IGBT) and a method for manufacturing the same is provided. This method is capable of preventing a latch-up and improving a short current characteristic. In the IGBT, a second conductive type semiconductor layer is formed over a semiconductor substrate. A first conductive type well is then formed beneath the surface of the semiconductor layer, and a second conductive type source region doped with a high concentration is formed in the well. Also, a gate electrode is formed over the semiconductor layer, but so as not to contact the source region in a region in which a contact between the source region and a cathode electrode is formed. Also, the IGBT further includes an impurity region for controlling latch-up, the impurity region being extended to a part of the semiconductor layer via the well.
Public/Granted literature
- US20010020719A1 INSULATED GATE BIPOLAR TRANSISTOR Public/Granted day:2001-09-13
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