- 专利标题: Process and apparatus for producing a planar body of an oxide single crystal
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申请号: US09897797申请日: 2001-07-02
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公开(公告)号: US06565654B2公开(公告)日: 2003-05-20
- 发明人: Toshihisa Yokoyama , Masahiro Murasato , Katsuhiro Imai , Minoru Imaeda
- 申请人: Toshihisa Yokoyama , Masahiro Murasato , Katsuhiro Imai , Minoru Imaeda
- 优先权: JP2000-203633 20000705
- 主分类号: C30B2102
- IPC分类号: C30B2102
摘要:
In a process for producing a planar body of an oxide single crystal with a &mgr; pulling-down method, a shoulder portion having a larger width is grown without any polycrystal regions, cracks or crystal deteriorations in a central portion of the planar body. A raw material of the oxide single crystal is melted in a crucible. A seed crystal is contacted to a melt of the raw material near an opening of a nozzle 13 of the crucible. Then, the melt 18 is drawn from the opening by pulling down the seed crystal to form a planar body 14A. A temperature distribution of the nozzle 13 in a direction perpendicular to the drawing direction B is controlled by supplying heat to the nozzle 13 and/or by removing heat from the nozzle 13.
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