- Patent Title: Semiconductor device and method of forming a semiconductor device
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Application No.: US09957609Application Date: 2001-09-21
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Publication No.: US06566240B2Publication Date: 2003-05-20
- Inventor: Florin Udrea , Gehan A. J. Amaratunga
- Applicant: Florin Udrea , Gehan A. J. Amaratunga
- Main IPC: H01L2144
- IPC: H01L2144

Abstract:
A semiconductor device having an active region is formed in a layer provided on a semiconductor substrate. At least a portion of the semiconductor substrate below at least a portion of the active region is removed such that the portion of the active region is provided in a membrane defined by that portion of the layer below which the semiconductor substrate has been removed. A heat conducting and electrically insulating layer is applied to the bottom surface of the membrane. The heat conducting and electrically insulating layer has a thermal conductivity that is higher than the thermal conductivity of the membrane so that the heat conducting and electrically insulating layer allows heat to pass from the active region into the heat conducting and electrically insulating layer during normal operation of the device.
Public/Granted literature
- US20020034843A1 Semiconductor device and method of forming a semiconductor device Public/Granted day:2002-03-21
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