Invention Grant
- Patent Title: Photosensitive phosphorylated phenol-formaldehyde resin and method for preparing the same
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Application No.: US09963420Application Date: 2001-09-27
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Publication No.: US06566483B2Publication Date: 2003-05-20
- Inventor: Ching-Sheng Cho , Shinn-Jen Chang , Wan-Jung Teng , Jiun-Ji Chen
- Applicant: Ching-Sheng Cho , Shinn-Jen Chang , Wan-Jung Teng , Jiun-Ji Chen
- Priority: TW89126878A 20001215
- Main IPC: C08G1404
- IPC: C08G1404

Abstract:
This invention discloses a photosensitive phosphorylated phenol-formaldehyde resin, characterized by containing in its molecule at least two phosphate groups, each phosphate group coupled with at least one photo-sensitive group. The photosensitive resin of the present invention is prepared by reacting a phenol-formaldehyde resin with phosphorus oxychloride to form a phosphorylated phenol-formaldehyde resin; then reacting the resin with a compound having one hydroxyl group and at least one ethylenically unsaturated bond, thereby esterifying some of the phosphorochloridate groups to produce a resin having ethylenically unsaturated bonds and unreacted phosphorochloridate groups; and hydrolyzing the unreacted phosphorochloridate groups into phosphoric groups. The photosensitive resin according to the invention is UV-curable and alkaline-soluble as traditional photosensitive resins are; moreover, it exhibits good flame retardant and adhesive properties.
Public/Granted literature
- US20020111454A1 Photosensitive phosphorylated phenol-formaldehyde resin and method for preparing the same Public/Granted day:2002-08-15
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