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公开(公告)号:US06566483B2
公开(公告)日:2003-05-20
申请号:US09963420
申请日:2001-09-27
Applicant: Ching-Sheng Cho , Shinn-Jen Chang , Wan-Jung Teng , Jiun-Ji Chen
Inventor: Ching-Sheng Cho , Shinn-Jen Chang , Wan-Jung Teng , Jiun-Ji Chen
IPC: C08G1404
Abstract: This invention discloses a photosensitive phosphorylated phenol-formaldehyde resin, characterized by containing in its molecule at least two phosphate groups, each phosphate group coupled with at least one photo-sensitive group. The photosensitive resin of the present invention is prepared by reacting a phenol-formaldehyde resin with phosphorus oxychloride to form a phosphorylated phenol-formaldehyde resin; then reacting the resin with a compound having one hydroxyl group and at least one ethylenically unsaturated bond, thereby esterifying some of the phosphorochloridate groups to produce a resin having ethylenically unsaturated bonds and unreacted phosphorochloridate groups; and hydrolyzing the unreacted phosphorochloridate groups into phosphoric groups. The photosensitive resin according to the invention is UV-curable and alkaline-soluble as traditional photosensitive resins are; moreover, it exhibits good flame retardant and adhesive properties.