发明授权
- 专利标题： Method of measuring optical aberration
- 专利标题（中）： 测量光学像差的方法
-
申请号： US10255700申请日： 2002-09-27
-
公开(公告)号： US06573015B2公开(公告)日： 2003-06-03
- 发明人: Masashi Fujimoto
- 申请人： Masashi Fujimoto
- 优先权： JP2000-063311 20000303
- 主分类号： G03F900
- IPC分类号： G03F900
摘要：
The present invention provides a mask for measuring an optical aberration, the mask including at least a measuring pattern comprising plural pattern parts being separated from each other, wherein the plural pattern parts provide individual widths which are simply increased on first and second directional axes non-parallel to each other and vertical to a plane of the mask, provided that the width of each of the plural pattern parts is unchanged at least on the first and second directional axes.