Operation Switch
    1.
    发明申请
    Operation Switch 有权
    操作开关

    公开(公告)号:US20120228108A1

    公开(公告)日:2012-09-13

    申请号:US13510081

    申请日:2010-11-08

    IPC分类号: H01H1/26

    摘要: A push button switch 1 is so constructed as to disengage the movable contacts 55b, 56b from the fixed contacts 55a, 56a through operation of the push button 2 held in the switch case 3. A first leaf spring 550 is provided in the switch case 3 to act as an opening-biasing means to bias the movable contacts 55b, 56b away from the fixed contacts 55a, 56a. The movable contact 55b is disposed at an end of the first leaf spring 550 and adapted to engage with and disengage from the fixed contact 55a. The first leaf spring 550 is adapted to be at a position where the movable contact 55b is open relative to and disengaged from the fixed contact 55a at zero displacement of the first leaf spring 550.

    摘要翻译: 按钮开关1被构造成通过操作保持在开关壳体3中的按钮2而将可动触点55b,56b与固定触点55a,56a分离。第一板簧550设置在开关壳体3中 以用作将可动触点55b,56b偏离固定触点55a,56a的打开偏压装置。 可移动触点55b设置在第一板簧550的端部并且适于与固定触点55a接合和脱开。 第一片簧550适于在第一片簧550的零位移处于可动触头55b相对于固定触点55a并相对于其脱开的位置。

    Method for manufacturing semiconductor device
    2.
    发明授权
    Method for manufacturing semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US07534727B2

    公开(公告)日:2009-05-19

    申请号:US11600057

    申请日:2006-11-16

    申请人: Masashi Fujimoto

    发明人: Masashi Fujimoto

    IPC分类号: H01L21/302

    摘要: A predetermined pattern containing a plurality of gate patterns, in the process of formation thereof, is classified into fine gate patterns and the other patterns (S102), and a hard mask film is formed on a process target film (S106). Next, a first resist film having a fine first pattern is formed on the hard mask film, and the hard mask film is then patterned (S108). Thereafter, a resist film having a separate pattern is formed on the hard mask film, and a process target film is selectively dry-etched through the hard mask film and the resist film used as masks (S110 and S112).

    摘要翻译: 在其形成过程中,包含多个栅极图案的预定图案分为精细栅极图案和其他图案(S102),并且在处理目标膜上形成硬掩模膜(S106)。 接着,在硬掩模膜上形成具有微细的第一图案的第一抗蚀剂膜,然后对硬掩模膜进行图案化(S108)。 此后,在硬掩模膜上形成具有单独图案的抗蚀剂膜,并且通过硬掩模膜和用作掩模的抗蚀剂膜选择性地干蚀刻处理目标膜(S110和S112)。

    Fixing device for use in an image forming device
    3.
    发明授权
    Fixing device for use in an image forming device 有权
    用于图像形成装置的固定装置

    公开(公告)号:US07383009B2

    公开(公告)日:2008-06-03

    申请号:US11896695

    申请日:2007-09-05

    申请人: Masashi Fujimoto

    发明人: Masashi Fujimoto

    IPC分类号: G03G15/20

    CPC分类号: G03G15/2053

    摘要: A fixing roller 30, which has an internal heating device and is supported to rotate around a cylindrical shaft 40, and a pressure roller 81 whose circumferential face presses against the fixing roller 30, and which is supported to rotate around the pressure roller axle 82, are mounted in a housing 11, so that, by passing paper P to which a toner image has been transferred, a fixing process is performed on this toner image. The fixing roller 30 is mounted in the housing 11 by heat resistant bushings 50, which are fitted on both ends of the cylindrical shaft 40. Annular grooves 41 are arranged on the cylindrical shaft 40 for receiving C-shaped retaining rings 70, for preventing the heat resistant bushings 50 from coming off. The heat resistant bushings 50 and the retaining rings 70 engage with each other to rotate in unison around the cylindrical shaft 40.

    摘要翻译: 具有内部加热装置并被支撑以围绕圆柱形轴40旋转的定影辊30和其周向压靠定影辊30并被支撑以围绕加压辊轴82旋转的加压辊81, 被安装在壳体11中,使得通过通过传送调色剂图像的纸张P对该调色剂图像进行定影处理。 定影辊30通过安装在圆柱形轴40的两端的耐热衬套50安装在壳体11中。环形槽41布置在圆柱形轴40上,用于接收C形保持环70,以防止 耐热衬套50脱落。 耐热衬套50和保持环70彼此接合以一体地围绕圆柱形轴40旋转。

    Fixing device for use in an image forming device
    4.
    发明授权
    Fixing device for use in an image forming device 有权
    用于图像形成装置的固定装置

    公开(公告)号:US07280794B2

    公开(公告)日:2007-10-09

    申请号:US11258220

    申请日:2005-10-26

    申请人: Masashi Fujimoto

    发明人: Masashi Fujimoto

    IPC分类号: G03G15/20

    CPC分类号: G03G15/2053

    摘要: A fixing roller 30, which has an internal heating device and is supported to rotate around a cylindrical shaft 40, and a pressure roller 81 whose circumferential face presses against the fixing roller 30, and which is supported to rotate around the pressure roller axle 82, are mounted in a housing 11, so that, by passing paper P to which a toner image has been transferred, a fixing process is performed on this toner image. The fixing roller 30 is mounted in the housing 11 by heat resistant bushings 50, which are fitted on both ends of the cylindrical shaft 40. Annular grooves 41 are arranged on the cylindrical shaft 40 for receiving C-shaped retaining rings 70, for preventing the heat resistant bushings 50 from coming off. The heat resistant bushings 50 and the retaining rings 70 engage with each other to rotate in unison around the cylindrical shaft 40.

    摘要翻译: 具有内部加热装置并被支撑以围绕圆柱形轴40旋转的定影辊30和其周向压靠定影辊30并被支撑以围绕加压辊轴82旋转的加压辊81, 被安装在壳体11中,使得通过通过传送调色剂图像的纸张P对该调色剂图像进行定影处理。 定影辊30通过安装在圆柱形轴40的两端的耐热衬套50安装在壳体11中。环形槽41布置在圆柱形轴40上,用于接收C形保持环70,以防止 耐热衬套50脱落。 耐热衬套50和保持环70彼此接合以一体地围绕圆柱形轴40旋转。

    Switch device
    5.
    发明申请
    Switch device 有权
    开关装置

    公开(公告)号:US20050284742A1

    公开(公告)日:2005-12-29

    申请号:US10526658

    申请日:2003-09-04

    摘要: When an operator applies a removing force to turn a switch portion b in a direction C2, a projection a4 abuts against a slope b71 so that the removing force as a reaction is applied to the slope. The removing force is divided into a component working along the slope b71 and a component F working in a same direction as a center axis X. Thus, the removing force is converted into a force F in the same direction as the center axis X. By means of the force F in the same direction as the center axis X, a pushbutton support b6 is moved downward as accordingly moving a movable contacts b9 away from a fixed contacts b12 via a contact axis b5.

    摘要翻译: 当操作者施加去除力以使开关部分b沿方向C 2转动时,突起a 4抵靠斜面b 71,使得作为反作用力的移除力被施加到斜面。 除去力被分为沿着斜面b 71工作的部件和与中心轴X相同的方向工作的部件F.因此,移除力被转换成与中心轴线X相同方向的力F. 通过力F沿与中心轴线X相同的方向,按钮支撑件b 6向下移动,因此使可动触头b9经由接触轴线b5远离固定触头b 12移动。

    Reticle system for measurement of effective coherence factors

    公开(公告)号:US06580492B2

    公开(公告)日:2003-06-17

    申请号:US09907039

    申请日:2001-07-17

    申请人: Masashi Fujimoto

    发明人: Masashi Fujimoto

    IPC分类号: G03B2768

    CPC分类号: G03F7/70091 G03F7/706

    摘要: A reticle system includes a reticle film having thereon a plurality of scale patterns each having a plurality of scale marks plotted therein, and a shield film having a plurality of pinholes each disposed corresponding to one of the scale patterns. A light emitted from a point light source having an effective coherent factor “x” and passing the reticle film at a scale mark “x” or below “x” in one of the scale patterns passes through the corresponding pinhole. After transferring the scale patterns onto a wafer surface, the effective coherent factors are read from the maximum scale marks for respective scale patterns on the wafer surface. The dispersion of the coherent factors can be calculated therefrom.

    Method of measuring optical aberration
    8.
    发明授权
    Method of measuring optical aberration 失效
    测量光学像差的方法

    公开(公告)号:US06573015B2

    公开(公告)日:2003-06-03

    申请号:US10255700

    申请日:2002-09-27

    申请人: Masashi Fujimoto

    发明人: Masashi Fujimoto

    IPC分类号: G03F900

    CPC分类号: G03F7/706

    摘要: The present invention provides a mask for measuring an optical aberration, the mask including at least a measuring pattern comprising plural pattern parts being separated from each other, wherein the plural pattern parts provide individual widths which are simply increased on first and second directional axes non-parallel to each other and vertical to a plane of the mask, provided that the width of each of the plural pattern parts is unchanged at least on the first and second directional axes.

    摘要翻译: 本发明提供了一种用于测量光学像差的掩模,所述掩模至少包括测量图案,所述测量图案包括彼此分离的多个图案部分,其中所述多个图案部分提供在第一和第二方向轴上简单增加的单独宽度, 平行于彼此并且垂直于掩模的平面,只要多个图案部分中的每一个的宽度至少在第一和第二方向轴上不变。

    PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PHASE SHIFT PHOTOMASK HAVING DUMMY GATE PATTERNS
    10.
    发明申请
    PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PHASE SHIFT PHOTOMASK HAVING DUMMY GATE PATTERNS 有权
    图案形成方法,半导体器件制造方法和具有双向栅格图案的相位移位光电子

    公开(公告)号:US20120237879A1

    公开(公告)日:2012-09-20

    申请号:US13484966

    申请日:2012-05-31

    申请人: Masashi Fujimoto

    发明人: Masashi Fujimoto

    IPC分类号: G03F7/20

    CPC分类号: G03F1/70 G03F1/26

    摘要: A method for manufacturing a semiconductor device that includes a plurality of gate patterns in parallel with each other within one circuit block provided over a semiconductor substrate includes preparing a first photomask, performing a first photolithography process upon a photoresist layer within a circuit block by using the first photomask, preparing a second photomask that includes a trim photomask having at least one trim opening corresponding to a dummy gate pattern to remove a portion of the photoresist layer corresponding to the dummy gate pattern, and performing a second photolithography process upon the photoresist layer by using the second photomask.

    摘要翻译: 一种制造半导体器件的方法,该半导体器件包括在半导体衬底上提供的一个电路块内彼此并联的多个栅极图案,包括制备第一光掩模,通过使用第一光掩模,在电路块内的光刻胶层上进行第一光刻工艺 第一光掩模,制备第二光掩模,其包括修整光掩模,所述修整光掩模具有对应于伪栅极图案的至少一个修剪开口,以去除对应于所述伪栅极图案的所述光致抗蚀剂层的一部分,以及对所述光致抗蚀剂层进行第二光刻工艺, 使用第二个光掩模。