发明授权
- 专利标题: Apparatus and method for processing a substrate
- 专利标题(中): 用于处理衬底的装置和方法
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申请号: US09469797申请日: 1999-12-22
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公开(公告)号: US06576061B1公开(公告)日: 2003-06-10
- 发明人: Koichiro Moriyama , Masahiro Kanai , Hirokazu Ohtoshi , Tadashi Hori , Naoto Okada , Hiroshi Shimoda , Hiroyuki Ozaki
- 申请人: Koichiro Moriyama , Masahiro Kanai , Hirokazu Ohtoshi , Tadashi Hori , Naoto Okada , Hiroshi Shimoda , Hiroyuki Ozaki
- 优先权: JP10-365066 19981222; JP11-359145 19991217
- 主分类号: H01L2100
- IPC分类号: H01L2100
摘要:
A substrate-processing method comprising transporting a substrate to pass through a plurality of processing spaces communicated with each other while processing said substrate in each processing space, characterized in that based on an inner pressure of (a) one of said plurality of processing spaces, said inner pressure of said processing space (a) and an inner pressure of (b) at least one of the processing spaces arranged before or after said processing space (a) are controlled. A substrate-processing apparatus comprising a plurality of processing spaces, a substrate transportation means for transporting a substrate to pass through said plurality of processing spaces while said substrate being processed in each processing space, and a pressure gage of measuring an inner pressure of (a) one of said plurality of processing spaces, characterized in that said substrate-processing apparatus has a control unit for controlling the inner pressure of said processing space (a) and that of (b) at least one of the processing spaces arranged before or after said processing space (a) based on information obtained from said pressure gage.
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