Invention Grant
- Patent Title: Method and apparatus for improved ion bunching in an ion implantation system
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Application No.: US10224778Application Date: 2002-08-21
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Publication No.: US06583429B2Publication Date: 2003-06-24
- Inventor: Kourosh Saadatmand , William F. DiVergilio
- Applicant: Kourosh Saadatmand , William F. DiVergilio
- Main IPC: B01D5944
- IPC: B01D5944

Abstract:
An ion buncher stage for a linear accelerator system is disclosed for bunching ions in an ion implantation system. The ion buncher stage may be employed upstream of one or more accelerating stages such that the loss of ions in the linear accelerator system is reduced. The invention further includes an asymmetrical double gap buncher stage, as well as a slit buncher stage for further improvement of ion implantation efficiency. Also disclosed are methods for accelerating ions in an ion implanter linear accelerator.
Public/Granted literature
- US20030038253A1 Method and apparatus for improved ion bunching in an ion implantation system Public/Granted day:2003-02-27
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