发明授权
US06583479B1 Sidewall NROM and method of manufacture thereof for non-volatile memory cells
有权
侧壁NROM及其制造方法用于非易失性存储单元
- 专利标题: Sidewall NROM and method of manufacture thereof for non-volatile memory cells
- 专利标题(中): 侧壁NROM及其制造方法用于非易失性存储单元
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申请号: US09688936申请日: 2000-10-16
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公开(公告)号: US06583479B1公开(公告)日: 2003-06-24
- 发明人: Richard M. Fastow , Shane C. Hollmer , Pau-Ling Chen , Michael Van Buskirk , Masaaki Higashitani
- 申请人: Richard M. Fastow , Shane C. Hollmer , Pau-Ling Chen , Michael Van Buskirk , Masaaki Higashitani
- 主分类号: H01L31062
- IPC分类号: H01L31062
摘要:
An non-volatile read only memory transistor for use in a memory array is disclosed. The non-volatile read only memory transistor features a substantially vertically oriented channel fabricated in a trench formed in the substrate. The channel length is dependent upon the depth of the trench and therefore a dense array of NROM transistors can be formed without adversely affecting the channel length and therefore the operational performance of the transistor.
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