发明授权
US06583479B1 Sidewall NROM and method of manufacture thereof for non-volatile memory cells 有权
侧壁NROM及其制造方法用于非易失性存储单元

Sidewall NROM and method of manufacture thereof for non-volatile memory cells
摘要:
An non-volatile read only memory transistor for use in a memory array is disclosed. The non-volatile read only memory transistor features a substantially vertically oriented channel fabricated in a trench formed in the substrate. The channel length is dependent upon the depth of the trench and therefore a dense array of NROM transistors can be formed without adversely affecting the channel length and therefore the operational performance of the transistor.
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