发明授权
- 专利标题： Treatment device, laser annealing device, manufacturing apparatus, and manufacturing apparatus for flat display device
- 专利标题（中）： 处理装置，激光退火装置，制造装置和平板显示装置的制造装置
-
申请号： US09867525申请日： 2001-05-31
-
公开(公告)号： US06588232B1公开(公告)日： 2003-07-08
- 发明人: Naoki Suzuki , Noriyuki Hirata , Masatoshi Shimizu , Takuo Higashijima , Hiroaki Takahashi , Yoshiaki Komatsubara
- 申请人： Naoki Suzuki , Noriyuki Hirata , Masatoshi Shimizu , Takuo Higashijima , Hiroaki Takahashi , Yoshiaki Komatsubara
- 优先权： JP10-005176 19980113; JP10-177516 19980624
- 主分类号： C03B2502
- IPC分类号： C03B2502
摘要：
A film forming device in a substrate manufacturing apparatus a stage section on which a cassette storing a plurality of glass substrates is mounted. A treatment section for subjecting the substrate to a predetermined treatment is arranged to oppose the stage section. A washing section for washing the substrate is arranged near the stage section and the treatment section and deviated from a space between the stage section and the treatment section in a second direction crossing a first direction passing through the stage section and the treatment section. A transfer robot is arranged between the stage section and the treatment section. The transfer robot transfers the substrate between the stage section, treatment section, and washing section and loads the substrate, washed in the washing section, directly into the treatment section.
信息查询
