发明授权
US06590239B2 Color filter image array optoelectronic microelectronic fabrication with a planarizing layer formed upon a concave surfaced color filter region
有权
滤色器图像阵列光电子微电子制造,其具有形成在凹面的滤色器区域上的平坦化层
- 专利标题: Color filter image array optoelectronic microelectronic fabrication with a planarizing layer formed upon a concave surfaced color filter region
- 专利标题(中): 滤色器图像阵列光电子微电子制造,其具有形成在凹面的滤色器区域上的平坦化层
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申请号: US09918043申请日: 2001-07-30
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公开(公告)号: US06590239B2公开(公告)日: 2003-07-08
- 发明人: Chung-Sheng Hsiung , Kuo-Liang Lu , Yu-Kung Hsiao , Chih-Kung Chang , Fu-Tien Wong , Sung-Yung Yang , Chin-Chen Kuo
- 申请人: Chung-Sheng Hsiung , Kuo-Liang Lu , Yu-Kung Hsiao , Chih-Kung Chang , Fu-Tien Wong , Sung-Yung Yang , Chin-Chen Kuo
- 主分类号: H01L27148
- IPC分类号: H01L27148
摘要:
Within a method for forming a color filter image array optoelectronic microelectronic fabrication, and the color filter image array optoelectronic microelectronic fabrication formed employing the method, there is provided a substrate having formed therein a series of photo active regions. There is also formed over the substrate at least one color filter layer having formed therein a color filter region having a concave upper surface. There is also formed upon the at least one color filter layer and planarizing the at least one color filter region having the concave upper surface, a planarizing layer. The planarizing layer provides for enhanced resolution of the color filter image array optoelectronic microelectronic fabrication.
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