发明授权
US06590239B2 Color filter image array optoelectronic microelectronic fabrication with a planarizing layer formed upon a concave surfaced color filter region 有权
滤色器图像阵列光电子微电子制造,其具有形成在凹面的滤色器区域上的平坦化层

Color filter image array optoelectronic microelectronic fabrication with a planarizing layer formed upon a concave surfaced color filter region
摘要:
Within a method for forming a color filter image array optoelectronic microelectronic fabrication, and the color filter image array optoelectronic microelectronic fabrication formed employing the method, there is provided a substrate having formed therein a series of photo active regions. There is also formed over the substrate at least one color filter layer having formed therein a color filter region having a concave upper surface. There is also formed upon the at least one color filter layer and planarizing the at least one color filter region having the concave upper surface, a planarizing layer. The planarizing layer provides for enhanced resolution of the color filter image array optoelectronic microelectronic fabrication.
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