Invention Grant
- Patent Title: Open chamber-type X-ray analysis apparatus
- Patent Title (中): 开放式X射线分析仪
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Application No.: US09827124Application Date: 2001-04-05
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Publication No.: US06590955B2Publication Date: 2003-07-08
- Inventor: Yoshiki Matoba , Mitsuo Naito , Koichi Tamura
- Applicant: Yoshiki Matoba , Mitsuo Naito , Koichi Tamura
- Priority: JP2000-104848 20000406; JP2001-048261 20010223
- Main IPC: G01N23223
- IPC: G01N23223

Abstract:
An open chamber-type X-ray fluorescence analysis apparatus is provided to analyze a large-sized sample located outside the open chamber. The apparatus has a helium inlet provided in the open chamber for injecting helium gas into the chamber to replace gas within the chamber with helium, a film attaching/removing mechanism for covering the opening in the chamber with a film having high transmittance with respect to X-rays, and a gas outlet provided in the chamber for allowing gas to exit the chamber.
Public/Granted literature
- US20010028698A1 Open chamber-type X-ray analysis apparatus Public/Granted day:2001-10-11
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