发明授权
- 专利标题: Method of controlling additives in copper plating baths
- 专利标题(中): 控制镀铜浴中添加剂的方法
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申请号: US09881817申请日: 2001-06-18
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公开(公告)号: US06592747B2公开(公告)日: 2003-07-15
- 发明人: Wilma Jean Horkans , Keith T. Kwietniak , Peter S. Locke
- 申请人: Wilma Jean Horkans , Keith T. Kwietniak , Peter S. Locke
- 主分类号: G01N2742
- IPC分类号: G01N2742
摘要:
Organic addition agents in copper plating baths are monitored by diluting a sample of the bath with sulfuric acid and hydrochloric acid and optionally a cupric salt. The diluting provides a bath having conventional concentrations of cupric ion, sulfuric acid and hydrochloric acid; and adjusted concentrations of the organic addition agents of 1/X of their original values in the sample; where X is the dilution factor. CVS techniques are used to determine concentrations of organic addition agents.
公开/授权文献
- US20030000850A1 Method of controlling additives in copper plating baths 公开/授权日:2003-01-02
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