发明授权
- 专利标题: Pseudomorphic high electron mobility transistor power device
- 专利标题(中): 伪态高电子迁移率晶体管功率器件
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申请号: US10112359申请日: 2002-03-29
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公开(公告)号: US06593603B1公开(公告)日: 2003-07-15
- 发明人: Haecheon Kim , Min Park , Jae-kyoung Mun , Chang-hee Hyoung , Hong-gu Ji , Ho-kyun Ahn
- 申请人: Haecheon Kim , Min Park , Jae-kyoung Mun , Chang-hee Hyoung , Hong-gu Ji , Ho-kyun Ahn
- 优先权: KR2001-86533 20011228
- 主分类号: H01L29739
- IPC分类号: H01L29739
摘要:
A pseudomorphic high electron mobility transistor (PHEMT) power device formed on a double planar doped epitaxial substrate and capable of operating with a single voltage source and a method for manufacturing the PHEMT power device are provided. The PHEMT power device includes: an epitaxial substrate including a GaAs buffer layer, an AlGaAs/GaAs superlattice layer, an updoped AlGaAs layer, a first doped silicon layer, a first spacer, an InGaAs electron transit layer, a second spacer, a second doped silicon layer having a different doping concentration from the first doped silicon layer, a lightly doped AlGaAs layer, and an undoped GaAs cap layer stacked sequentially on a semi-insulating GaAs substrate; a source electrode and a drain electrode formed on and in ohmic contact with the undoped GaAs cap layer; and a gate electrode formed on the lightly doped AlGaAs layer to extend through the undoped GaAs cap layer.
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