Invention Grant
- Patent Title: Method of preparing buried LOCOS collar in trench DRAMS
- Patent Title (中): 在沟槽DRAMS中制备掩埋LOCOS环的方法
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Application No.: US09910771Application Date: 2001-07-24
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Publication No.: US06599798B2Publication Date: 2003-07-29
- Inventor: Helmut Tews , Stephan Kudelka , Uwe Schroeder , Rolf Weis
- Applicant: Helmut Tews , Stephan Kudelka , Uwe Schroeder , Rolf Weis
- Main IPC: H01L218242
- IPC: H01L218242
Abstract:
The vertical DRAM capacitor with a buried LOCOS collar characterized by: a self-aligned bottle and gas phase doping; no consumption of silicon at the depth of the buried strap; no reduction of trench diameter; and a nitride layer to protect trench sidewalls during gas phase doping.
Public/Granted literature
- US20030020110A1 METHOD OF PREPARING BURIED LOCOS COLLAR IN TRENCH DRAMS Public/Granted day:2003-01-30
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