Invention Grant
- Patent Title: Charged-particle beam exposure apparatus and device manufacturing method
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Application No.: US09842120Application Date: 2001-04-26
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Publication No.: US06603128B2Publication Date: 2003-08-05
- Inventor: Hiroshi Maehara , Haruhito Ono , Yasuhiro Shimada , Takayuki Yagi
- Applicant: Hiroshi Maehara , Haruhito Ono , Yasuhiro Shimada , Takayuki Yagi
- Priority: JP2000-128513 20000427; JP2001-124727 20010423
- Main IPC: H01J3700
- IPC: H01J3700

Abstract:
A correction electron optical system (3) has substrates in which apertures for constituting electron lenses are formed. Valves (14) whose opening degrees can be adjusted are used to relax the pressure difference between the upper and lower surfaces of each substrate caused when supply/exhaust pumps (51-56) adjust the internal pressure of a main body cover (80). The opening degrees are controlled based on outputs from differential pressure sensors (13). The pressure sensors (13) can be replaced with photosensors.
Public/Granted literature
- US20020009901A1 Charged-particle beam exposure apparatus and device manufacturing method Public/Granted day:2002-01-24
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