发明授权
- 专利标题: Ion implanter
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申请号: US09939749申请日: 2001-08-28
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公开(公告)号: US06614190B2公开(公告)日: 2003-09-02
- 发明人: Hiroyuki Tomita , Kazuo Mera , Isao Hashimoto , Yasunori Nakano , Takayoshi Seki
- 申请人: Hiroyuki Tomita , Kazuo Mera , Isao Hashimoto , Yasunori Nakano , Takayoshi Seki
- 优先权: JP2001-023241 20010131; JP2001-023386 20010131
- 主分类号: H05B3126
- IPC分类号: H05B3126
摘要:
A wafer holder for holding a wafer includes a wafer holder base, a wafer fixing part, holder pins, a bearing, a housing, and a coil spring. The wafer fixing part is fixed to an outer circumference of a wafer holder. The holder pins are arranged to face the wafer fixing part. The holder pin is rotatably supported by the bearing. The holder pins are movably supported along the diameter direction of the wafer holder base by the coil spring. In the process of holding a side of the wafer with the holder pins, when force from the wafer works on the holder pins, the holder pins are rotated with a Z axis as a center, thus reducing frictional force between the holder pin and the wafer. Accordingly, it is possible to prevent particle generation from holding an implanting object.
公开/授权文献
- US20020105277A1 Ion implanter 公开/授权日:2002-08-08