发明授权
- 专利标题: Exposure method
- 专利标题(中): 曝光方法
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申请号: US09747910申请日: 2000-12-22
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公开(公告)号: US06617097B2公开(公告)日: 2003-09-09
- 发明人: Yasunori Nishimura , Taimi Oketani , Tsuyoshi Naraki
- 申请人: Yasunori Nishimura , Taimi Oketani , Tsuyoshi Naraki
- 优先权: JP11-365004 19991222
- 主分类号: G03C556
- IPC分类号: G03C556
摘要:
The present invention aims at reducing the number of scanning exposure and at enhancing throughput. the above-mentioned objective is achieved by allowing a substrate 14 to be placed in sideways with respect to a substrate holder 15a (placing the longer sides of the substrate in parallel to the shorter sides of the substrate holder) depending on the size of the apparatus and the size of the substrate 14. It is acceptable even when areas other than an effective exposure area of the substrate 14 should project out from the substrate holder.
公开/授权文献
- US20010006764A1 Exposure method 公开/授权日:2001-07-05
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