发明授权
US06620029B2 Apparatus and method for front side chemical mechanical planarization (CMP) of semiconductor workpieces
有权
半导体工件的前侧化学机械平面化(CMP)的装置和方法
- 专利标题: Apparatus and method for front side chemical mechanical planarization (CMP) of semiconductor workpieces
- 专利标题(中): 半导体工件的前侧化学机械平面化(CMP)的装置和方法
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申请号: US10059775申请日: 2002-01-30
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公开(公告)号: US06620029B2公开(公告)日: 2003-09-16
- 发明人: Raymond M. Khoury , Jose M. Ocasio , Uldis A. Ziemins
- 申请人: Raymond M. Khoury , Jose M. Ocasio , Uldis A. Ziemins
- 主分类号: B24B100
- IPC分类号: B24B100
摘要:
An apparatus for performing semiconductor planarizing operations is disclosed. In an exemplary embodiment, the apparatus includes a carrier assembly for maintaining a workpiece therein in a face up orientation. A roller assembly includes a first cylindrical roller and a cylindrical second roller, the first and second rollers being linked to one another through a pair of arms. Each of the first and second rollers may be independently positioned with respect to a horizontal plane, the horizontal plane being substantially parallel to a top surface of the workpiece.
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