发明授权
US06620029B2 Apparatus and method for front side chemical mechanical planarization (CMP) of semiconductor workpieces 有权
半导体工件的前侧化学机械平面化(CMP)的装置和方法

Apparatus and method for front side chemical mechanical planarization (CMP) of semiconductor workpieces
摘要:
An apparatus for performing semiconductor planarizing operations is disclosed. In an exemplary embodiment, the apparatus includes a carrier assembly for maintaining a workpiece therein in a face up orientation. A roller assembly includes a first cylindrical roller and a cylindrical second roller, the first and second rollers being linked to one another through a pair of arms. Each of the first and second rollers may be independently positioned with respect to a horizontal plane, the horizontal plane being substantially parallel to a top surface of the workpiece.
信息查询
0/0