A new method is provided for the creation of a protective layer over a glass substrate, the glass substrate has a first and a second surface. Under a first embodiment of the invention, a second surface of the glass panel is first coated with a layer of TiN. A first layer of amorphous silicon (A—Si) is deposited over the second surface of the glass panel. A second layer of amorphous silicon (A—Si) is deposited over the layer of TiN. A layer of photoresist is next deposited over the surface of the second layer of A—Si. The first layer of A—Si is removed from the second surface of the glass panel after which the layer of photoresist is removed. Under a second embodiment of the invention, the first and the second surface of the glass panel are coated with a first and a second layer of TiN. A layer of amorphous silicon (A—Si) is deposited over the second layer of TiN. A layer of photoresist is deposited over the layer of A—Si. The first layer of TiN on the first surface of the glass panel is removed after which the layer of photoresist is removed.