发明授权
- 专利标题： Method of manufacturing electron-emitting device as well as electron source and image-forming apparatus
- 专利标题（中）： 制造电子发射器件的方法以及电子源和图像形成装置
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申请号： US08781206申请日： 1997-01-10
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公开(公告)号： US06626719B2公开(公告)日： 2003-09-30
- 发明人: Takeo Ono , Hisaaki Kawade , Yoshinobu Sekiguchi , Yasuhiro Hamamoto , Keisuke Yamamoto , Takeo Tsukamoto , Masato Yamanobe
- 申请人： Takeo Ono , Hisaaki Kawade , Yoshinobu Sekiguchi , Yasuhiro Hamamoto , Keisuke Yamamoto , Takeo Tsukamoto , Masato Yamanobe
- 优先权： JP6-167986 19940720
- 主分类号： H01J902
- IPC分类号： H01J902
摘要：
An electron-emitting device comprises a pair of oppositely disposed electrodes and an electroconductive film inclusive of an electron-emitting region arranged between the electrodes. The electric resistance of the electroconductive film is reduced after forming the electron-emitting region in the course of manufacturing the electron-emitting device.
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