- 专利标题: Film forming apparatus and film forming method
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申请号: US10154111申请日: 2002-05-21
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公开(公告)号: US06627263B2公开(公告)日: 2003-09-30
- 发明人: Takahiro Kitano , Masateru Morikawa , Masami Akimoto , Kazuhiro Takeshita
- 申请人: Takahiro Kitano , Masateru Morikawa , Masami Akimoto , Kazuhiro Takeshita
- 优先权: JP10-173229 19980619; JP10-364943 19981222
- 主分类号: B05D312
- IPC分类号: B05D312
摘要:
A film forming apparatus comprising a substrate holding section for holding a substrate to be processed, a nozzle unit arranged and opposing the substrate holding section, having a discharge hole for continuously applying film-forming solution, in the form of a slender stream, to a surface of a substrate held by the substrate holding section, and a drive mechanism for driving the substrate and the nozzle unit relative to each other, thereby to coat the surface of the substrate with the solution, while the nozzle unit is applying the solution, in the form of a slender stream, to the surface of the substrate.
公开/授权文献
- US20020136829A1 Film forming apparatus and film forming method 公开/授权日:2002-09-26
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