Coating method employing supply of pellets to a heated substrate
    1.
    发明授权
    Coating method employing supply of pellets to a heated substrate 失效
    使用向加热的基材供应丸粒的涂布方法

    公开(公告)号:US06797321B2

    公开(公告)日:2004-09-28

    申请号:US10203213

    申请日:2002-10-21

    申请人: Udo Buecher

    发明人: Udo Buecher

    IPC分类号: B05D312

    摘要: A method of forming a coating of a polymer-based paint composition on a substrate is disclosed. The method is based on the use of pellets rather than solid blocks of the paint composition. The method includes pre-heating a substrate to a temperature that is above the glass transition temperature of the polymer of the paint composition and supplying pellets of the paint composition to the surface of the substrate, whereby the pellets progressively melt into a liquid state. Thereafter, the method includes forming a coating of the liquid paint composition on the substrate surface and converting the liquid coating into a solid coating of the paint composition.

    摘要翻译: 公开了一种在基材上形成聚合物基涂料组合物涂层的方法。 该方法基于使用颗粒而不是油漆组合物的固体块。 该方法包括将基材预热到高于涂料组合物的聚合物的玻璃化转变温度的温度,并将涂料组合物的颗粒供给到基材的表面,由此颗粒逐渐融化成液态。 此后,该方法包括在基材表面上形成液体涂料组合物的涂层,并将该液体涂料转化成涂料组合物的固体涂料。

    Film forming apparatus and film forming method
    3.
    发明授权
    Film forming apparatus and film forming method 失效
    成膜装置及成膜方法

    公开(公告)号:US06706322B2

    公开(公告)日:2004-03-16

    申请号:US10062506

    申请日:2002-02-05

    IPC分类号: B05D312

    摘要: A drive pulley is disposed to a driving motor. A plurality of follower pulleys are disposed to a rotating shaft of a spin chuck that vacuum sucks a substrate. A belt is passed from one follower pulley to the drive pulley. Belts are passed from the other follower pulleys to the drive shafts of a plurality of air motors. Since the air motors assist the driving of the driving motor, a large substrate can be rotated at a predetermined rotating acceleration. Thus, a film forming apparatus and a film forming method that allow the quantity of process solution supplied to be reduced and a film of process solution to be equally formed on a substrate can be provided.

    摘要翻译: 驱动皮带轮设置在驱动马达上。 多个从动带轮设置在旋转卡盘的旋转轴上,真空吸附基板。 皮带从一个从动轮传递到驱动皮带轮。 皮带从其他从动滑轮传递到多个气动马达的驱动轴。 由于空气马达有助于驱动马达的驱动,因此可以以预定的旋转加速度旋转大的基板。 因此,可以提供允许提供的处理溶液量减少并且可以在基板上同样形成处理溶液膜的成膜装置和成膜方法。

    Cellulose preservative method and apparatus

    公开(公告)号:US06696102B2

    公开(公告)日:2004-02-24

    申请号:US09766385

    申请日:2001-01-19

    申请人: James N. Ray

    发明人: James N. Ray

    IPC分类号: B05D312

    摘要: A method and apparatus for applying a fluid preservative to wood or wood products has a work tank for maintaining a predetermined concentration of preservative in the fluid. The work tank is equipped with a heater to keep the temperature of the fluid and the preservative in the work tank at a predetermined level. Hot fluid and preservative is drawn under a vacuum, initially from the work tank. On filling a pressure vessel, a pressure pump then supplies the preservative and fluid mixture under pressure to the pressure vessel in which the wood or wood product is being treated. As the treatment process depletes the preservative in the fluid, through absorption in the wood, the depleted fluid is circulated back to the work tank where it is heated and more preservative is added to restore the concentration of preservative in the fluid to a desired level. The fluid, replenished with preservative, is then pumped into the pressure vessel. In this way a more uniform distribution of preservative in a desired concentration is achieved in the treated wood or wood product.

    Method of and apparatus for coating a wafer with a minimal layer of photoresist
    5.
    发明授权
    Method of and apparatus for coating a wafer with a minimal layer of photoresist 失效
    用最小的光刻胶层涂覆晶片的方法和装置

    公开(公告)号:US06652911B2

    公开(公告)日:2003-11-25

    申请号:US09428557

    申请日:1999-10-28

    IPC分类号: B05D312

    CPC分类号: G03F7/162 B05C11/08

    摘要: In a photoresist coating apparatus and method, a rotating wafer is scanned with a spray nozzle from which the photoresist issues. The rotational speed of the wafer is varied based on the relative position of the nozzle above the wafer. The varying of the rotational speed is designed to minimize the amount of photoresist necessary for coating the wafer. Specifically, the photoresist is sprayed from the nozzle while the nozzle scans the wafer in a direction from the peripheral edge of the wafer toward its center, and the rotational speed of the wafer is increased during such scanning.

    摘要翻译: 在光致抗蚀剂涂覆设备和方法中,旋转的晶片用喷嘴喷射,光致抗蚀剂从该喷嘴喷射。 基于晶片上方的喷嘴的相对位置来改变晶片的旋转速度。 旋转速度的变化被设计为最小化涂覆晶片所需的光致抗蚀剂的量。 具体地说,当喷嘴从晶片的周缘朝向其中心的方向扫描晶片时,从喷嘴喷射光致抗蚀剂,并且在这种扫描期间晶片的旋转速度增加。

    Method and arrangement in a drive device of a rod coating station
    9.
    发明授权
    Method and arrangement in a drive device of a rod coating station 失效
    棒涂机的驱动装置中的方法和装置

    公开(公告)号:US06616977B1

    公开(公告)日:2003-09-09

    申请号:US10109092

    申请日:2002-03-26

    申请人: Pekka Koskela

    发明人: Pekka Koskela

    IPC分类号: B05D312

    摘要: A method and arrangement using the drive device of a rod coating station to carry axial forces, in which the drive device includes at least a telescopic articulated shaft, at the first end of which is a changeable grooved rod and at the opposite end of which is the shaft of the drive motor. The rotation of the rod creates an axial force, which is cancelled by a counterforce from the articulated shaft side, which is brought to the end of the rod. The counterforce is brought to the rod through the articulated shaft from the drive motor side.

    摘要翻译: 一种使用棒涂装置的驱动装置承载轴向力的方法和装置,其中驱动装置包括至少一个可伸缩的铰接轴,其中第一端是一个可更换的带槽的杆,并且在其相对的末端是 驱动电机的轴。 杆的旋转产生轴向力,其被从被连接到杆的端部的铰接轴侧的反作用力抵消。 反作用力通过驱动马达侧的铰接轴被带到杆上。

    System for and method of using developer as a solvent to spread photoresist faster and reduce photoresist consumption
    10.
    发明授权
    System for and method of using developer as a solvent to spread photoresist faster and reduce photoresist consumption 有权
    使用显影剂作为溶剂的系统和方法更快地扩散光致抗蚀剂消耗

    公开(公告)号:US06592939B1

    公开(公告)日:2003-07-15

    申请号:US09875596

    申请日:2001-06-06

    申请人: James Jiahua Yu

    发明人: James Jiahua Yu

    IPC分类号: B05D312

    CPC分类号: H01L21/6715 G03F7/162

    摘要: An exemplary method of using developer as a solvent to spread photoresist faster and reduce photoresist consumption can include dispensing a developer solution onto an integrated circuit wafer, spinning the integrated circuit wafer to distribute the developer solution over the integrated circuit wafer, and dispensing a photoresist solution onto the integrated circuit covered with the developer solution.

    摘要翻译: 使用显影剂作为溶剂以更快地铺展光致抗蚀剂消耗的示例性方法可以包括将显影剂溶液分配到集成电路晶片上,旋转集成电路晶片以将显影剂溶液分布在集成电路晶片上,并且分配光致抗蚀剂溶液 覆盖开发商解决方案的集成电路。