发明授权
US06635185B2 Method of etching and cleaning using fluorinated carbonyl compounds
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使用氟化羰基化合物进行蚀刻和清洗的方法
- 专利标题： Method of etching and cleaning using fluorinated carbonyl compounds
- 专利标题（中）： 使用氟化羰基化合物进行蚀刻和清洗的方法
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申请号： US09001325申请日： 1997-12-31
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公开(公告)号： US06635185B2公开(公告)日： 2003-10-21
- 发明人: Timothy R. Demmin , Matthew H. Luly , Mohammed A. Fathimulla
- 申请人： Timothy R. Demmin , Matthew H. Luly , Mohammed A. Fathimulla
- 主分类号： H01L213065
- IPC分类号： H01L213065
摘要：
A method comprising etching a material under plasma etching conditions using an etching composition which has a GWP of no greater than about 3000 and which comprises at least one etchant compound having a formula selected from the group consisting of F—CO—[(CR1R2)m—CO]n—F and F—CO—R3—CO—F, and wherein: m=0, 1, 2, 3, 4, or 5; n=1; R1 & R2 represent H, F or CxHyFz; wherein: x=1 or 2; and y+z=2x+1; R3 represents CR4═CR5, R6R7C═C or C≡C; wherein: R4-7 represent H, F, or CxHyFz; wherein: x=1 or 2; and y+z=2x+1; and also including the cleaning of a surface by use of an etchant compound, and further including an etching composition which includes said etchant compound and also an etchant-modifier.
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