Abstract:
A process for producing a fluoroolefin of the formula: CF3CY═CXnHp wherein Y is a hydrogen atom or a halogen atom (i.e., fluorine, chlorine, bromine or iodine); X is a hydrogen atom or a halogen atom (i.e., fluorine, chlorine, bromine or iodine); n and p are integers independently equal to 0, 1 or 2, provided that (n+p)=2; comprising contacting, in the presence of a phase transfer catalyst, a compound of the formula: CF3C(R1aR2b)C(R3cR4d), wherein R1, R2, R3, and R4 are independently a hydrogen atom or a halogen selected from the group consisting of fluorine, chlorine, bromine and iodine, provided that at least one of R1, R2, R3, and R4 is halogen and there is at least one hydrogen and one halogen on adjacent carbon atoms; a and b are independently=0, 1 or 2 and (a+b)=2; and c and d are independently=0, 1, 2 or 3 and (c+d)=3; and at least one alkali metal hydroxide. The alkali metal hydroxide can be, for example, potassium or sodium hydroxide and the phase transfer catalyst can be, for example, at least one: crown ether such as 18-crown-6 and 15-crown-5; or onium salt such as, quaternary phosphonium salt and quaternary ammonium salt. The olef in is useful, for example, as an intermediate for producing other industrial chemicals and as a monomer for producing oligomers and polymers.
Abstract:
A process for preparing 1-chloro-1,1,3,3,3-pentafluoropropane, CF3CH2CF2Cl, comprising contacting in a reaction zone in the substantial absence of oxygen, reactants comprising chlorine and 1,1,1,3,3-pentafluoropropane, CF3CH2CHF2 (also referred to as HFC-245fa), and subjecting the reactants to actinic radiation, such as UV light at about 2,000 to 4,000 Angstroms, wherein: (1) inert gas is present at a concentration equal to or less than about 5 wt. % of the total weight of reactants; (2) the molar ratio of chlorine to CF3CH2CHF2 is from about 0.2:1 to about 1.5:1; and (3) the concentration of chlorinated product produced having greater than one chlorine present in the molecule is less than or equal to about 10 wt. %.
Abstract:
The present invention relates to foam compositions which are expanded with hydrohalocarbon blowing agents in the presence of catalysts which are capable of decreasing the amount of decomposition of the hydrohalocarbon blowing agents to haloalkenes during the polymerization. Thus, the present invention provides compositions comprising polyisocyanate, polyol, hydrohalocarbon blowing agent, surfactant, and catalyst for polymerization of the polyisocyanate and polyol wherein the catalyst is capable of decreasing the amount of decomposition of the hydrohalocarbon blowing agents to haloalkenes during polymerization of the polyisocyanate and the polyol.
Abstract:
Substituted and unsubstituted phenols, catechols and orthobenzoquinones are converted to muconic acid mononitriles by reaction with copper(II)-ammonia reagents. The copper(II)-ammonia reagents can be prepared by the reaction of cuprous chloride with oxygen or air in liquid ammonia or in ammonium hydroxide or in pyridine followed by addition of ammonia or ammonium hydroxide. The muconic acid mononitriles are useful as monomers or comonomers and as intermediates in the manufacture of substituted and unsubstituted 6-aminocaproic acids, caprolactams and polyamides.
Abstract:
Muconic acid monoesters of alkanediols of 2-6 carbons and of phenol are prepared by copper (II) oxidative cleavage of phenols, catechols or orthobenzoquinones. The products are useful as comonomers in polyamides and other polymers. The alkanediol or phenol is introduced into the copper (II) reactant or catalyst.
Abstract:
Ketals of .alpha.-oximinoketones and methods for the preparation of these compounds including intermediates are described. The compounds disclosed include both .alpha.-oximinoketals and cyclic ketals of .alpha.-oximinoketones. Also disclosed is a class of .alpha.-nitrosoketal dimers produced during the synthesis of the corresponding .alpha.-oximinoketals and the method for their preparation.
Abstract:
A method comprising etching a material under plasma etching conditions using an etching composition which has a GWP of no greater than about 3000 and which comprises at least one etchant compound having a formula selected from the group consisting of F—CO—[(CR1R2)m—CO]n—F and F—CO—R3—CO—F, and wherein: m=0, 1, 2, 3, 4, or 5; n=1; R1 & R2 represent H, F or CxHyFz; wherein: x=1 or 2; and y+z=2x+1; R3 represents CR4═CR5, R6R7C═C or C≡C; wherein: R4-7 represent H, F, or CxHyFz; wherein: x=1 or 2; and y+z=2x+1; and also including the cleaning of a surface by use of an etchant compound, and further including an etching composition which includes said etchant compound and also an etchant-modifier.
Abstract translation:一种方法,包括使用GWP不大于约3000的蚀刻组合物在等离子体蚀刻条件下蚀刻材料,并且其包含至少一种具有选自F-CO - [(CR 1) > R 2)m-CO] n F和F-CO-R 3 -CO-F,并且其中:m = 0,1,2,3,4或5; n = 1; R 1 >&R <2>表示H,F或CxHyFz; 其中:x = 1或2; andy + z = 2x + 1; R 3表示CR 4 = CR 5,R 6 R 7 C = C或C = C; 其中:R 4-7表示H,F或CxHyFz; 其中:x = 1或2; andy + z = 2x + 1;并且还包括通过使用蚀刻剂化合物清洁表面,并且还包括包括所述蚀刻剂化合物和蚀刻剂改性剂的蚀刻组合物。
Abstract:
A process for preparing a fluorinated product comprising: (a) reacting a molar excess of an aliphatic starting compound in liquid phase with fluorine in the presence of actinic radiation to produce a product mixture containing a fluorinated product having at least one hydrogen atom; and (b) recovering the fluorinated product from the product stream.
Abstract:
A method of etching comprising subjecting a material under plasma etching conditions to an etching composition comprising at least an etchant compound having the formula C.sub.X H.sub.C F.sub.Zwherein: x=3, 4 or 5;2x.gtoreq.z.gtoreq.y;and y+z=2x+2; andfurther including an etching composition which includes said etchant compound and a second material different from the etchant compound that enhances or modifies plasma etching.
Abstract translation:一种蚀刻方法,包括在等离子体蚀刻条件下对材料进行处理,所述蚀刻组合物至少包含具有式CXHCFZ的蚀刻剂化合物,其中:x = 3,4或5; 2x> / = z> / = y; y + z = 2x + 2; 并且还包括包含所述蚀刻剂化合物和不同于蚀刻剂化合物的第二材料的蚀刻组合物,其增强或改性等离子体蚀刻。
Abstract:
A process for the continuous production of telomers CCl.sub.3 (CH.sub.2 CCl.sub.2).sub.n Cl where n=1-3 (Formula I) by the continuous reaction of CCl.sub.4 and vinylidene chloride in the presence of a solvent and a catalyst. The reaction to form CCl.sub.3 (CH.sub.2 CCl.sub.2)Cl proceeds at a reaction rate constant k.sub.1. If n=1, CCl.sub.3 (CH.sub.2 CCl.sub.2)Cl is continuously removed from the reactor. If n=2, the removed CCl.sub.3 (CH.sub.2 CCl.sub.2)Cl reacts similarly with CCl.sub.4 and CH.sub.2 .dbd.CCl.sub.2 in a second reactor to form and remove CCl.sub.3 (CH.sub.2 CCl.sub.2).sub.2 Cl under conditions to have a reaction rate constant k.sub.2, wherein the ratio of the molar amounts of CCl.sub.4 to CCl.sub.3 (CH.sub.2 CCl.sub.2)Cl reacted is greater than the ratio k.sub.2 /k.sub.1. If n=3, the removed CCl.sub.3 (CH.sub.2 CCl.sub.2).sub.2 Cl similarly reacts in a third reactor with CCl.sub.4 and CH.sub.2 .dbd.CCl.sub.2 to form CCl.sub.3 (CH.sub.2 CCl.sub.2).sub.3 Cl under conditions to have a reaction rate constant k.sub.3, wherein the ratio of the molar amounts of CCl.sub.4 to CCl.sub.3 (CH.sub.2 CCl.sub.2).sub.2 Cl reacted is greater than the ratio k.sub.3 /k.sub.2.