发明授权
US06635890B2 Slit double gap buncher and method for improved ion bunching in an ion implantation system
有权
狭缝双缝隙聚束器和离子注入系统中改进离子聚束的方法
- 专利标题: Slit double gap buncher and method for improved ion bunching in an ion implantation system
- 专利标题(中): 狭缝双缝隙聚束器和离子注入系统中改进离子聚束的方法
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申请号: US10224779申请日: 2002-08-21
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公开(公告)号: US06635890B2公开(公告)日: 2003-10-21
- 发明人: Kourosh Saadatmand , William F. DiVergilio
- 申请人: Kourosh Saadatmand , William F. DiVergilio
- 主分类号: H01J37317
- IPC分类号: H01J37317
摘要:
An ion buncher stage for a linear accelerator system is disclosed for bunching ions in an ion implantation system. The ion buncher stage may be employed upstream of one or more accelerating stages such that the loss of ions in the linear accelerator system is reduced. The invention further includes an asymmetrical double gap buncher stage, as well as a slit buncher stage for further improvement of ion implantation efficiency. Also disclosed are methods for accelerating ions in an ion implanter linear accelerator.
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