发明授权
US06649323B2 Overcoat for light-sensitive materials comprising (1-vinylimidazole) polymer or copolymer
失效
包含（1-乙烯基咪唑）聚合物或共聚物的感光材料的外涂层
- 专利标题： Overcoat for light-sensitive materials comprising (1-vinylimidazole) polymer or copolymer
- 专利标题（中）： 包含（1-乙烯基咪唑）聚合物或共聚物的感光材料的外涂层
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申请号： US09489414申请日： 2000-01-21
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公开(公告)号： US06649323B2公开(公告)日： 2003-11-18
- 发明人: Socrates Peter Pappas , Harald Baumann , Udo Dwars , Celin M. Savariar-Hauck , Hans-Joachim Timpe
- 申请人： Socrates Peter Pappas , Harald Baumann , Udo Dwars , Celin M. Savariar-Hauck , Hans-Joachim Timpe
- 优先权： DE19732902 19970730
- 主分类号： G03F7028
- IPC分类号： G03F7028
摘要：
A lithographic printing plate precursor comprises a substrate, a free radical polymerizable photosensitive layer comprising a light-sensitive composition on the substrate, and a water-soluble overcoat layer on the photosensitive layer, wherein the overcoat layer comprises polyvinyl alcohol, and a further component that is not amphoteric and is poly(1-vinylimidazole) or a copolymer of 1-vinylimidazole and at least one further monomer. The photosensitive layer comprises a free radical polymerizable component and a photoinitiator.
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