公开(公告)号：US09329485B2

公开(公告)日：2016-05-03

申请号：US14484333

申请日：2014-09-12

Applicant: Christopher D. Simpson ,  Harald Baumann ,  Michael Flugel ,  Saija Werner ,  Oliver Piestert ,  Udo Dwars

Inventor： Christopher D. Simpson ,  Harald Baumann ,  Michael Flugel ,  Saija Werner ,  Oliver Piestert ,  Udo Dwars

IPC: G03F7/32 ,  G03F7/38 ,  B41C1/10

CPC classification number: G03F7/38 ,  B41C1/1008 ,  G03F7/32

Abstract: Lithographic printing plates are provided by imagewise exposing negative-working lithographic printing plate precursors having a negative-working radiation-sensitive imageable layer, followed by contacting with a processing solution that has a pH of at least 7 and up to and including 11. This processing solution also includes component (1) that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40° C.; component (2) that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40° C.; component (3) that is a hydroxy-containing solution promoter; and component (4) that is a hydrophilic surface protective compound. The method is carried out in a manner such that the exposed and processed precursor is not further treated with any liquid (such as gumming or rinsing solution) between processing and mounting onto a printing press.

Abstract translation: 平版印刷版通过成像曝光具有负性辐射敏感可成像层的负性平版印刷版原版提供，然后与pH至少为7且高达11并且包括11的处理溶液接触。这种处理 溶液还包括作为大气压熔点至少为40℃的含氮碱的组分（1）。 组分（2），其是独立地具有至少40℃的大气压熔点，玻璃化转变温度或倾点的非离子表面活性剂。 作为含羟基溶液促进剂的组分（3）; 和作为亲水性表面保护性化合物的成分（4）。 该方法以这样的方式进行，使得在处理和安装到印刷机上之前，曝光和加工的前体不被任何液体（例如上胶或漂洗溶液）进一步处理。

公开(公告)号：US08318405B2

公开(公告)日：2012-11-27

申请号：US12403458

申请日：2009-03-13

Applicant: Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Bernd Strehmel

Inventor： Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Bernd Strehmel

IPC: B32B3/10 ,  G03F7/09 ,  G03F7/11

CPC classification number: G03F7/092 ,  G03F7/11 ,  Y10T428/24802

Abstract: Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat disposed on the imageable layer. This overcoat comprises at least one poly(vinyl alcohol) having a saponification degree of at least 90%, an alkoxylation product of an alkanol, and either a 2-sulfonato succinic acid dialkylester or an alkoxylation product of a 1,4-butanediol.

Abstract translation: 负性可成像元件可用于提供平版印刷版。 可成像元件具有合适的辐射敏感可成像层和设置在可成像层上的水溶性外涂层。 该外涂层包含至少一种皂化度至少为90％的聚（乙烯醇），链烷醇的烷氧基化产物，2-磺酸丁二酸二烷基酯或1,4-丁二醇的烷氧基化产物。

公开(公告)号：US07442486B2

公开(公告)日：2008-10-28

申请号：US10544758

申请日：2004-02-20

Applicant: Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Michael Flugel

Inventor： Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Michael Flugel

IPC: G03C1/76 ,  G03C1/492 ,  G03C1/494 ,  G03C5/00 ,  G03C1/00

CPC classification number: G03F7/029 ,  G03F7/031

Abstract: Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R1, R2 and R3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group —NR4R5 and a group —OR6, wherein R4 and R5 are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R6 is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.

公开(公告)号：US5698360A

公开(公告)日：1997-12-16

申请号：US677703

申请日：1996-07-10

Applicant: Hans-Joachim Timpe ,  Udo Dwars ,  Harald Baumann ,  Celin Savariar-Hauck

Inventor： Hans-Joachim Timpe ,  Udo Dwars ,  Harald Baumann ,  Celin Savariar-Hauck

IPC: C08F8/34 ,  G03F7/021 ,  G03F7/033

CPC classification number: G03F7/0212 ,  C08F8/34 ,  G03F7/0215 ,  G03F7/033

Abstract: The present invention relates to binders and photosensitive compositions comprising said binders. The binder comprises units A, B, C and D, wherein A is present in an amount of 0.5 to 15 wt. % and is of the formula ##STR1## B is present in an amount of 10 to 35 wt. % and is of the formula ##STR2## C is present in an amount of 10 to 50 wt. % and is of the formula ##STR3## wherein R.sup.1 is methyl, ethyl, propyl or isopropyl, and D is present in an amount of 25 to 70 wt. % and is of the formula ##STR4## wherein n is an integer of from 1 to 3 and R.sup.2, R.sup.3 are hydrogen or methyl and R.sup.4 is alkyl, aralkyl or aryl.

Abstract translation: 本发明涉及包含所述粘合剂的粘合剂和光敏组合物。 粘合剂包含单元A，B，C和D，其中A的存在量为0.5-15wt。 （A）B以10〜35重量％的量存在。 ％，并且具有式50重量％ ％，并且具有式（C）的式（C）其中R 1是甲基，乙基，丙基或异丙​​基，D以25至70重量％的量存在。 ％，并且具有式（D）的式（I）其中n是1至3的整数，R 2，R 3是氢或甲基，R 4是烷基，芳烷基或芳基。

公开(公告)号：US09029063B2

公开(公告)日：2015-05-12

申请号：US13239435

申请日：2011-09-22

Applicant: Domenico Balbinot ,  Harald Baumann ,  Udo Dwars ,  Mathias Jarek ,  Christopher D. Simpson

Inventor： Domenico Balbinot ,  Harald Baumann ,  Udo Dwars ,  Mathias Jarek ,  Christopher D. Simpson

IPC: G03F7/00 ,  G03F7/26 ,  G03F7/029 ,  G03F7/031

CPC classification number: G03F7/029 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/266 ,  G03F7/031

Abstract: A lithographic printing plate precursor comprises an imagable layer comprising a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to imaging infrared radiation, an infrared radiation absorbing dye comprising an infrared radiation absorbing cation and a counter anion, and a polymeric binder. The salt formed between the infrared radiation absorbing cation and a tetraphenyl borate has solubility in 2-methoxy propanol at 20° C. that is greater than or equal to 3.5 g/l. The use of these infrared radiation absorbing dyes in the imagable layers provides a reduced tendency of these dyes to crystallize in the presence of tetraaryl borate counter anions.

Abstract translation: 平版印刷版前体包括可成像层，其包含可自由基聚合的组分，在暴露于成像红外辐射时能够产生自由基的引发剂组合物，包含红外辐射吸收阳离子和抗衡阴离子的红外辐射吸收染料，以及聚合物 粘合剂 在红外辐射吸收阳离子和四苯基硼酸盐之间形成的盐在20℃下在2-甲氧基丙醇中具有大于或等于3.5g / l的溶解度。 在可成像层中使用这些红外辐射吸收染料提供这些染料在硼酸四芳基酯阴离子存在下结晶的趋势。

公开(公告)号：US07615323B2

公开(公告)日：2009-11-10

申请号：US11718809

申请日：2005-11-11

Applicant: Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

Inventor： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

IPC: G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  B41C1/10

CPC classification number: G03F7/029 ,  G03F7/031 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/127 ,  Y10S522/904 ,  Y10S522/913

Abstract: Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.

Abstract translation: 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由基聚合的烯键式不饱和基团，（ii）至少一种敏化剂和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p1是芳族或杂芳族单元或两者的组合，使得共轭的n体系存在于 结构（I）中的两个基团Z，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各自 R 3，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或1-4的整数，n的值> 1，AS是脂肪族间隔基。

公开(公告)号：US20090211477A1

公开(公告)日：2009-08-27

申请号：US12401739

申请日：2009-03-11

Applicant: Harald Baumann ,  Udo Dwars ,  Jorg Heinemann ,  Michael Mursal ,  Marco Scala

Inventor： Harald Baumann ,  Udo Dwars ,  Jorg Heinemann ,  Michael Mursal ,  Marco Scala

IPC: B41N3/00 ,  B08B7/00

CPC classification number: B41F35/04 ,  B41P2235/20

Abstract: An apparatus and related method for preparing a lithographic web during manufacturing by incorporating a cleaning device cleaning device capable of being in contact with one or more web rollers. The cleaning device including a cleaning applicator to apply the cleaning solution such that the cleaning solution connected to the cleaning applicator, and a controller to move the applicator from an operational mode to a self-cleaning mode.

Abstract translation: 一种用于在制造期间通过结合能够与一个或多个卷筒纸辊接触的清洁装置清洁装置来制备平版印刷卷材的装置和相关方法。 清洁装置包括清洁施加器以施加清洁溶液，使得连接到清洁施加器的清洁溶液和控制器将施加器从操作模式移动到自清洁模式。

公开(公告)号：US07574959B2

公开(公告)日：2009-08-18

申请号：US10580357

申请日：2004-11-18

Applicant: Harald Baumann ,  Udo Dwars ,  Michael Flugel

Inventor： Harald Baumann ,  Udo Dwars ,  Michael Flugel

IPC: G03C1/73 ,  B32B17/06 ,  C08J7/04 ,  B41N1/00

CPC classification number: G03F7/031 ,  Y10T428/31591

Abstract: Radiation-sensitive composition comprising (a) at least one photopolymerizable compound with at least one ethylenically unsaturated group accessible to a free-radical polymerization, wherein the at least one photopolymerizable compound has a molecular weight of 3,000 or less and can be obtained by reacting a diisocyanate with (I) an ethylenically unsaturated compound with a hydroxy group, and at the same time (ii) a saturated organic compound with an NH group and an OH group, wherein the reactants are used in amounts according to the following condition: Number of moles of isocyanate groups ≦number of moles of OH plus NH groups; (b) at least one sensitizer which absorbs radiation from the wavelength range of 250 to 450 nm of the electromagnetic spectrum and is selected from: dihydropyridines of formula (I) and oxazole derivatives of formula (II): (II) (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from 2,2′,4,4′,5′5-hexaarylbiimidazoles, compounds with at least one photolytically cleavable trihalogenmethyl group, diaryliodonium salts, triarylsulfonium salts and N-heterocyclic compounds with at least one nitrogen atom in the ring, having an oxy substituent at least one ring nitrogen atom, and mixtures of the above compounds; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors; with the proviso that the radiation-sensitive composition does not comprise a metallocene.

Abstract translation: 辐射敏感性组合物，其包含（a）至少一种可光聚合化合物与至少一种可自由基聚合的烯键式不饱和基团，其中所述至少一种可光聚合化合物的分子量为3,000以下，可以通过使 二异氰酸酯与（I）具有羟基的烯属不饱和化合物，同时（ii）具有NH基和OH基的饱和有机化合物，其中反应物的用量按照以下条件使用： 异氰酸酯基团的摩尔数= OH加NH基团的摩尔数; （b）至少一种吸收来自电磁波谱的波长范围为250至450nm的辐射的敏化剂，并选自：式（I）的二氢吡啶和式（II）的恶唑衍生物：（II）（c） 能够与敏化剂（b）一起形成自由基的至少一种共引发剂，并选自2,2'，4,4'，5,5'-六芳基联咪唑，具有至少一个可光解裂解的三卤代甲基的化合物，二芳基碘鎓盐，三芳基锍盐 和环中具有至少一个氮原子的N-杂环化合物，至少一个环氮原子具有氧取代基，以及上述化合物的混合物; 和（d）任选的一种或多种选自碱溶性粘合剂，着色剂，曝光指示剂，增塑剂，链转移剂，无色染料，表面活性剂，无机填料和热聚合抑制剂的组分; 条件是辐射敏感组合物不包含金属茂。

公开(公告)号：US07285372B2

公开(公告)日：2007-10-23

申请号：US10536514

申请日：2003-11-28

Applicant: Harald Baumann ,  Michael Flugel ,  Udo Dwars ,  Eduard Kottmair

Inventor： Harald Baumann ,  Michael Flugel ,  Udo Dwars ,  Eduard Kottmair

IPC: G03F7/028 ,  G03F7/029 ,  G03F7/027

CPC classification number: B41M5/46 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/029 ,  Y10S430/118

Abstract: Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.

Abstract translation: 辐射敏感元件包括（a）具有至少一个亲水表面的基底和（b）基底的至少一个亲水表面上的辐射敏感涂层，其中所述涂层包括：（i）至少一种可自由基聚合的 具有至少一个烯键式不饱和基团的单体和/或低聚物和/或聚合物，（ii）至少一种选自光引发剂和敏化剂的吸收剂，其能够吸收波长在250-1200nm范围内的辐射和（ iii）至少一种稳定剂在其分子中包含至少一个能够抑制自由基聚合的基团，以及至少一种能够在基材亲水表面吸附的其它基团。

公开(公告)号：US07169534B2

公开(公告)日：2007-01-30

申请号：US10536510

申请日：2003-11-28

Applicant: Harald Baumann ,  Michael Flugel ,  Udo Dwars ,  Hans-Horst Glatt

Inventor： Harald Baumann ,  Michael Flugel ,  Udo Dwars ,  Hans-Horst Glatt

IPC: G03F7/027

CPC classification number: G03F7/027 ,  C08G18/6715 ,  C08G18/7831

Abstract: Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.

Abstract translation: 描述了辐射敏感元件，其辐射敏感性涂层包括具有缩二脲结构单元的光聚合低聚物和可光聚合的磷腈低聚物。