A method for forming a pixel-defining layer on an OLED panel comprises the following steps: (A) providing a substrate; (B) forming plurality of electrodes on the substrate; (C) coating a layer of anti-glare compositions comprising non-photosensitive polyimide and light-absorbing pigments or dyes on the substrate; (D) first prebaking the substrate with the layer of the anti-glare compositions; (E) coating a layer of photoresist compositions on the layer of anti-glare compositions; (F) second prebaking the substrate with the anti-glare compositions and the photoresist; (G) forming patterns of the photoresist through exposing the substrate to masked radiation, developing the photoresist on the substrate, etching the layer of the anti-glare compositions and the photoresist at the same time to form patterned layers of the anti-glare polyimide or polyimide precursor compositions and patterned photoresist; and (I) baking the substrate with the patterned anti-glare polyimide or polyimide precursor compositions for crosslinking or curing to form the anti-glare pixel-defining layers.