发明授权
US06657281B1 Bipolar transistor with a low K material in emitter base spacer regions 失效
在发射极基极间隔区域中具有低K材料的双极晶体管

Bipolar transistor with a low K material in emitter base spacer regions
摘要:
The present invention provides a bipolar transistor located on a semiconductor wafer substrate. The bipolar transistor may comprise a collector located in the semiconductor wafer substrate, a base located in the collector, and an emitter located on the base and in contact with at least a portion of the base, wherein the emitter has a low K layer located therein. The low K layer may be, for example, located proximate a side of the emitter, or it may be located proximate opposing sides of the emitter. In all embodiments, however, the low K layer does not interfere with the proper functioning of the bipolar transistor, and substantially reduces the emitter-base capacitance typically associated with conventional bipolar transistors.
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