发明授权
US06657281B1 Bipolar transistor with a low K material in emitter base spacer regions
失效
在发射极基极间隔区域中具有低K材料的双极晶体管
- 专利标题: Bipolar transistor with a low K material in emitter base spacer regions
- 专利标题(中): 在发射极基极间隔区域中具有低K材料的双极晶体管
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申请号: US09631755申请日: 2000-08-03
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公开(公告)号: US06657281B1公开(公告)日: 2003-12-02
- 发明人: Yih-Feng Chyan , Chunchieh Huang , Chung Wai Leung , Yi Ma , Shahriar Moinian
- 申请人: Yih-Feng Chyan , Chunchieh Huang , Chung Wai Leung , Yi Ma , Shahriar Moinian
- 主分类号: H01L27082
- IPC分类号: H01L27082
摘要:
The present invention provides a bipolar transistor located on a semiconductor wafer substrate. The bipolar transistor may comprise a collector located in the semiconductor wafer substrate, a base located in the collector, and an emitter located on the base and in contact with at least a portion of the base, wherein the emitter has a low K layer located therein. The low K layer may be, for example, located proximate a side of the emitter, or it may be located proximate opposing sides of the emitter. In all embodiments, however, the low K layer does not interfere with the proper functioning of the bipolar transistor, and substantially reduces the emitter-base capacitance typically associated with conventional bipolar transistors.
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