Invention Grant
- Patent Title: Electroless copper plating bath, electroless copper plating method and electronic part
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Application No.: US09880335Application Date: 2001-06-13
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Publication No.: US06660071B2Publication Date: 2003-12-09
- Inventor: Yasushi Yoshida , Tatsuo Kunishi
- Applicant: Yasushi Yoshida , Tatsuo Kunishi
- Priority: JP2000-183455 20000619
- Main IPC: C23C1840
- IPC: C23C1840

Abstract:
An electroless copper plating bath containing a cupric compound, a cupric ion complexing agent, a reducing agent, and a pH adjusting agent is provided, in which a carboxylic acid is added as a reaction accelerator to accelerate the oxidation reaction of the reducing agent. It does not need to use formaldehyde as the reducing agent yet it has a plating reaction velocity which is equivalent to that of a bath in which formaldehyde is contained as the reducing agent.
Public/Granted literature
- US20020011176A1 Electroless copper plating bath, electroless copper plating method and electronic part Public/Granted day:2002-01-31
Information query