发明授权
US06660819B2 Method for producing synthetic polymerizates with a very low residual monomer content, products produced according to this method and the use thereof 有权
制备具有非常低残留单体含量的合成聚合物的方法,根据该方法生产的产品及其用途

  • 专利标题: Method for producing synthetic polymerizates with a very low residual monomer content, products produced according to this method and the use thereof
  • 专利标题(中): 制备具有非常低残留单体含量的合成聚合物的方法,根据该方法生产的产品及其用途
  • 申请号: US10260440
    申请日: 2002-10-01
  • 公开(公告)号: US06660819B2
    公开(公告)日: 2003-12-09
  • 发明人: Miroslav ChmelirKurt Dahmen
  • 申请人: Miroslav ChmelirKurt Dahmen
  • 优先权: DE19752127 19971125
  • 主分类号: C08F200
  • IPC分类号: C08F200
Method for producing synthetic polymerizates with a very low residual monomer content, products produced according to this method and the use thereof
摘要:
The invention relates to a process for producing water-soluble or water-swellable polymer products with low levels of residual monomers using acrylic acid and/or acrylic acid derivatives, which process is characterized by adding a nitrogen compound to the monomer solution to be polymerized and subsequent heating of the polymer product at temperatures of from 120 to 240° C. The polymers produced accordingly are suitable for use as flocculants, dispersants and absorbents.
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