发明授权
- 专利标题: Method for fabricating a circuit device
- 专利标题(中): 电路装置的制造方法
-
申请号: US10172419申请日: 2002-06-14
-
公开(公告)号: US06664138B2公开(公告)日: 2003-12-16
- 发明人: Yusuke Igarashi , Noriaki Sakamoto , Yoshiyuki Kobayashi , Takeshi Nakamura
- 申请人: Yusuke Igarashi , Noriaki Sakamoto , Yoshiyuki Kobayashi , Takeshi Nakamura
- 优先权: JPP.2001-185424 20010619
- 主分类号: H01L2150
- IPC分类号: H01L2150
摘要:
A method for fabricating a circuit device is provided. An insulation resin sheet having the first conductive layer 3 and the second conductive layer 4 adhered to each other by insulation resin 2 is used, the first conductive path layer 5 is formed by the first conductive layer 3, and semiconductor elements 7 are adhered to and fixed on overcoating resin 8 that covers the first conductive path layer 5, thereby freely routing the first conductive path layer 5 having fine patterns below the semiconductor elements 7. Furthermore, the second conductive layer 4 that has been formed to be thick is removed after a package is sealed with a sealing resin layer 13, and external electrodes 14 are formed in through holes of the insulation resin 2.
公开/授权文献
- US20020192875A1 Method for fabricating a circuit device 公开/授权日:2002-12-19
信息查询