发明授权
- 专利标题: Semiconductor power component and a corresponding manufacturing method
- 专利标题(中): 半导体功率元件及相应的制造方法
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申请号: US10119515申请日: 2002-04-10
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公开(公告)号: US06674125B2公开(公告)日: 2004-01-06
- 发明人: Wolfgang Feiler , Robert Plikat
- 申请人: Wolfgang Feiler , Robert Plikat
- 优先权: DE10117801 20010410
- 主分类号: H01L2976
- IPC分类号: H01L2976
摘要:
A semiconductor power component is described having a rear-side anode contact, a rear-side emitter region of a first conductivity type, which is connected to the rear-side anode contact, a drift region, which is connected to the rear-side emitter region and partially extends to the front-side surface, a front-side MOS control structure, and a front-side cathode contact, which is connected to the source region and the body region. The drift region includes a first drift region of the second conductivity type, a second drift region of the second conductivity type, and a third drift region of the first conductivity type. The first drift region is a buried region. The second drift region connects the front-side surface to the first drift region. The third drift region borders on a body region and connects the front side surface to the first drift region. The degree of compensation to be determined from the second and third drift region is greater than one and has a maximum in the area of the side of the third drift region that is facing away from the front-side surface. The present invention also creates a corresponding manufacturing method.
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