发明授权
US06677173B2 Method of manufacturing a nitride semiconductor laser with a plated auxiliary metal substrate 失效
用镀覆辅助金属基板制造氮化物半导体激光器的方法

  • 专利标题: Method of manufacturing a nitride semiconductor laser with a plated auxiliary metal substrate
  • 专利标题(中): 用镀覆辅助金属基板制造氮化物半导体激光器的方法
  • 申请号: US09818941
    申请日: 2001-03-28
  • 公开(公告)号: US06677173B2
    公开(公告)日: 2004-01-13
  • 发明人: Hiroyuki Ota
  • 申请人: Hiroyuki Ota
  • 优先权: JP2000-089440 20000328
  • 主分类号: H01L2100
  • IPC分类号: H01L2100
Method of manufacturing a nitride semiconductor laser with a plated auxiliary metal substrate
摘要:
The disclosure is a method of manufacturing a nitride semiconductor laser wherein a plurality of crystal layers made of group III nitride semiconductors, including an active layer, are successively stacked on an underlayer. The method includes the steps of forming the plurality of crystal layers on the underlayer formed on a substrate, forming an electrode layer on the outermost surface of the crystal layers, plating a metal film onto the electrode layer, irradiating an interface between the substrate and the underlayer with light through the substrate toward so as to form a region of decomposed substances of the nitride semiconductor, delaminating the underlayer that supports the crystal layers from the substrate along the decomposed substance region, and cleaving the underlayer with the crystal layers so as to form cleaved planes constituting a laser resonator.
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