发明授权
- 专利标题: EUV radiation source
- 专利标题(中): EUV辐射源
-
申请号: US10397526申请日: 2003-03-27
-
公开(公告)号: US06677600B2公开(公告)日: 2004-01-13
- 发明人: Mitsuru Ikeuchi
- 申请人: Mitsuru Ikeuchi
- 优先权: JP2002-087925 20020327
- 主分类号: G21G400
- IPC分类号: G21G400
摘要:
An EUV radiation source comprises a first electrode having a first through hole, a second electrode having a second through hole, a movable insulator, having a plurality of third through holes, provided between the first and second electrodes, wherein actuating gas is introduced in the first, second through holes and one of the plurality of third through holes, and voltage is impressed between the first and second electrodes when the first, second and plural through holes are located on a common axis.
公开/授权文献
- US20030183787A1 EUV radiation source 公开/授权日:2003-10-02
信息查询