Invention Grant
- Patent Title: Plating catalysts and electronic packaging substrates plated therewith
- Patent Title (中): 电镀催化剂和电子封装基板
-
Application No.: US10000865Application Date: 2001-10-24
-
Publication No.: US06680273B2Publication Date: 2004-01-20
- Inventor: Martin T. Goosey , Narinder Singh Bains
- Applicant: Martin T. Goosey , Narinder Singh Bains
- Priority: GB0025990 20001024
- Main IPC: B01J3100
- IPC: B01J3100

Abstract:
Disclosed are new catalysts for electroless metallization deposition, particularly catalysts that can be selectively activated and may be free of palladium and/or tin. Catalysts of the invention are preferably employed for electroless copper deposition.
Public/Granted literature
- US20020069788A1 Plating catalysts and electronic packaging substrates plated therewith Public/Granted day:2002-06-13
Information query