发明授权
- 专利标题: Halogen-modified silicon, surfaces
- 专利标题(中): 卤素改性硅,表面
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申请号: US09770885申请日: 2001-01-26
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公开(公告)号: US06689858B2公开(公告)日: 2004-02-10
- 发明人: Robert J. Hamers , Wei Cai , Lloyd M. Smith , Todd C. Strother
- 申请人: Robert J. Hamers , Wei Cai , Lloyd M. Smith , Todd C. Strother
- 主分类号: C08G7700
- IPC分类号: C08G7700
摘要:
Chemically-modified surfaces on unoxidized, bromine- or iodine-terminated carbon, silicon, and germanium substrates are disclosed. Visible light mediates the reaction of protected &ohgr;-modified, &agr;-unsaturated aminoalkenes (preferred) with bromine- or iodine-terminated carbon, silicon, or germanium surfaces. Removal of the protecting group yields an aminoalkane-modified silicon surface. These amino groups can be coupled to terminal-modified oligonucleotides using a bifunctional crosslinker, thereby permitting the preparation of modified surfaces and arrays. Methods for controlling the surface density of molecules attached to the substrate are also disclosed.
公开/授权文献
- US20020137195A1 Halogen-modified carbon, silicon, & germanium surfaces 公开/授权日:2002-09-26