Invention Grant
- Patent Title: Lateral semiconductor device
- Patent Title (中): 侧面半导体器件
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Application No.: US09870040Application Date: 2001-05-30
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Publication No.: US06693340B1Publication Date: 2004-02-17
- Inventor: Gehan Anil Joseph Amaratunga , Ranick Kian Ming Ng , Florin Udrea
- Applicant: Gehan Anil Joseph Amaratunga , Ranick Kian Ming Ng , Florin Udrea
- Priority: GB0111556 20010511
- Main IPC: H01L2358
- IPC: H01L2358

Abstract:
A lateral semiconductor device has a semiconductor layer on an insulating layer on a semiconductor substrate. The semiconductor layer has a region of a first conduction type and a region of a second conduction type with a drift region therebetween. The drift region is provided by a region of the first conduction type and a region of the second conduction type. The first and second conduction type drift regions are so arranged that when a reverse voltage bias is applied across the first and second conduction type regions of the semiconductor layer, the second conduction type drift region has an excess of charge relative to the first conduction type drift region which varies substantially linearly from the end of the drift region towards the first conduction type region of the semiconductor layer to the end of the drift region towards the second conduction type region of the semiconductor layer.
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