发明授权
US06696916B2 Integrated vertical resistor structure with reduced dimensions, for high voltage, and manufacturing process thereof 有权
集成的垂直电阻器结构,具有减小的尺寸,用于高电压及其制造工艺

  • 专利标题: Integrated vertical resistor structure with reduced dimensions, for high voltage, and manufacturing process thereof
  • 专利标题(中): 集成的垂直电阻器结构,具有减小的尺寸,用于高电压及其制造工艺
  • 申请号: US09746373
    申请日: 2000-12-22
  • 公开(公告)号: US06696916B2
    公开(公告)日: 2004-02-24
  • 发明人: Delfo SanfilippoDavide Patti
  • 申请人: Delfo SanfilippoDavide Patti
  • 优先权: ITTO99A1151 19991224
  • 主分类号: H01C1012
  • IPC分类号: H01C1012
Integrated vertical resistor structure with reduced dimensions, for high voltage, and manufacturing process thereof
摘要:
The high-voltage resistor is of the vertical type, and is formed in a chip which includes a high-voltage region and a low-voltage region superimposed on the high-voltage region, both having a first conductivity type. An isolation region, at least partially buried, extends between the high-voltage region and the low-voltage region, and delimits a vertical resistive region connecting the high-voltage region to the low-voltage region.
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