Invention Grant
US06696916B2 Integrated vertical resistor structure with reduced dimensions, for high voltage, and manufacturing process thereof 有权
集成的垂直电阻器结构,具有减小的尺寸,用于高电压及其制造工艺

  • Patent Title: Integrated vertical resistor structure with reduced dimensions, for high voltage, and manufacturing process thereof
  • Patent Title (中): 集成的垂直电阻器结构,具有减小的尺寸,用于高电压及其制造工艺
  • Application No.: US09746373
    Application Date: 2000-12-22
  • Publication No.: US06696916B2
    Publication Date: 2004-02-24
  • Inventor: Delfo SanfilippoDavide Patti
  • Applicant: Delfo SanfilippoDavide Patti
  • Priority: ITTO99A1151 19991224
  • Main IPC: H01C1012
  • IPC: H01C1012
Integrated vertical resistor structure with reduced dimensions, for high voltage, and manufacturing process thereof
Abstract:
The high-voltage resistor is of the vertical type, and is formed in a chip which includes a high-voltage region and a low-voltage region superimposed on the high-voltage region, both having a first conductivity type. An isolation region, at least partially buried, extends between the high-voltage region and the low-voltage region, and delimits a vertical resistive region connecting the high-voltage region to the low-voltage region.
Information query
Patent Agency Ranking
0/0