Invention Grant
- Patent Title: Stereolithographically marked semiconductor devices and methods
- Patent Title (中): 立体显微镜的半导体器件和方法
-
Application No.: US10301209Application Date: 2002-11-21
-
Publication No.: US06703105B2Publication Date: 2004-03-09
- Inventor: Ford B. Grigg , James M. Ocker , Rick A. Leininger
- Applicant: Ford B. Grigg , James M. Ocker , Rick A. Leininger
- Main IPC: B32B310
- IPC: B32B310

Abstract:
A stereolithographically fabricated marking for a semiconductor device component, such as a packaged or unpackaged semiconductor device or another substrate. When formed on a semiconductor device with a stereolithographically formed package structure, the marking may be integral with the package. The marking may be formed as apertures through or recesses in one or more stereolithographically fabricated layers of material, or the marking may include one or more stereolithographically fabricated layers that protrude from a surface of a semiconductor device component. Raised markings may also be formed on the surfaces of packaged or bare semiconductor device components. Alternatively, the marking may be fabricated separately from a semiconductor device component, then secured thereto. Methods for stereolithographically marking semiconductor device components are also disclosed. A machine vision system may be used in such methods so as to recognize the position and orientation of a semiconductor device or other substrate to be stereolithographically marked.
Public/Granted literature
- US20030072926A1 Stereolithographically marked semiconductor devices and methods Public/Granted day:2003-04-17
Information query